MM-80 Large Platform Metallographic Microscope

Functional Features

• Adopting an excellent infinite optical system can provide outstanding optical performance;

• The compact and stable high rigidity body fully embodies the seismic requirements of microscopic operations;

• Flat field wide-angle eyepiece with a field of view that can reachΦ22mmMake visual observation broader and more comfortable;

• Large stroke mechanical mobile loading platform, suitable for microscopic observation of large samples or rapid detection of multiple samples;

• Rear mounted camera interface design ensures that camera accessories no longer interfere with visual observation (using 100% light, suitable for low light micro photography cameras)

• Modular functional design makes it easy to upgrade the system and achieve functions such as polarization observation, dark field observation, DIC differential interference observation, etc;

application

80seriesLarge platformregularitymetallurgical microscopeAdopting an infinite distance correction optical system, it has a large field of view, high imaging quality, and strong functional scalability(dark field/DICobserve)Characteristics such as large platforms; Equipped withFast and Slow MovingLarge stroke stage, especially suitable for the inspection of semiconductor masks, liquid crystal substrates, other flat displays, and various industrial devices; It can be upgraded to a digital microscope camera according to customer needs.

At the same time, the "Professional Metallographic Structure Chart Quantitative Analysis Software" can be selected for real-time research and analysis of metallographic charts, such as grain size measurement rating, non-metallic inclusion measurement rating, and pearlite/Measurement rating of ferrite content, measurement rating of graphite spheroidization rate of ductile iron, decarburization layer/Analysis, statistics, and output of graphic and textual reports on the measurement of carburized layer and surface coating thickness.

Product specifications

Instrument completeness

Digital application solution configuration