Detailed information on the Ultima IV series combination multifunctional X-ray diffractometer:

1、 Instrument Introduction

Combination multifunctionalXXRDUltima IVSeries is a high-performance and multifunctional powder crystalXThe X-ray diffractometer adopts the principles of physicsCBOCross optical system, one instrument can perform from ordinary powder samples to includingIn-PlaneInternal film sample testing. Adopting a modular structure, various tests can be conducted by combining different units.

2、 Technical parameters

1. XThe power of the radiation generator is3KW

2. The angle measuring instrument is a horizontal angle measuring instrument

3. The smallest step of the angle measuring instrument is1/10000degree

4. Goniometer with programmable variable slit

5. High reflection efficiency graphite monochromator

6. CBOCross optical path, providing focused optical path and high-intensity high-resolution parallel optical path (withMirror）(Unique to Neo Confucianism)

7. Small angle scattering test component

8. Multi purpose thin film testing module

9. Micro area testing component

10. In-PlaneTest component (unique to science)

11. High speed detectorD/teX-Ultra

12. XX-ray diffraction-Differential scanning calorimeter simultaneous measurement deviceXRD-DSC

13. The analysis software includes:XRDAnalyze software packagesNANO-SolverSoftware packageGXRRSoftware packages, etc

3、 Main features

Combination multifunctionalXXRDUltima IVThe series can be widely applied in various fields of material structure analysis.

The materials that can be analyzed include: metal materials, inorganic materials, composite materials, organic materials, nanomaterials, and superconducting materials.

The material states that can be analyzed include: powder samples, block samples, thin film samples, and micro area micro samples

The main applications are:

1. Qualitative and quantitative analysis of phase composition of powder samples

2. Calculate crystallinity and grain size

3. Determine crystal system, grain size, and distortion

4. Rietveldstructural analysis

5. Thin film sample analysis, including thin film phase, multilayer film thickness, surface roughness, and charge density

6. In-PlaneThe device can simultaneously measure the vertical structure of the sample and the depth structure of the sample

7. Small angle scattering and particle size distribution of nanomaterials

8. Analysis of micro area samples